These implement the Density Gradient method in a way similar to this paper: @ARTICLE{WettsteinVLSI2002, author={Andreas Wettstein and Oleg Penzin and Eugeny Lyumkis}, title={Integration of the Density Gradient Model into a General Purpose Device Simulator}, journal={VLSI Design}, volume={15}, number={4}, pages={751--759}, year={2002}, doi={10.1080/1065514021000012363}, } With the insulator boundary condition described in: @ARTICLE{GarciaAsenov2011, author={Garcia-Loureiro, A.J. and Seoane, N. and Aldegunde, M. and Valin, R. and Asenov, A. and Martinez, A. and Kalna, K.}, journal=ieeetcad, title={Implementation of the Density Gradient Quantum Corrections for 3-D Simulations of Multigate Nanoscaled Transistors}, year={2011}, month=jun, volume={30}, number={6}, pages={841--851}, doi={10.1109/TCAD.2011.2107990}, ISSN={0278-0070},} test_1D.py 1D simulation plots runs.sh Runs 1D plots for different doping and oxide thicknesses moscap2d.geo 3nm tox from gmsh test_2d.py 2d example