lithography
There are 25 repositories under lithography topic.
TorchOPC/TorchLitho
Differentiable Computational Lithogrpahy Framework
HelgeGehring/gdshelpers
GDSHelpers is an open-source package for automatized pattern generation for nano-structuring.
pierremifasol/Lithography-Simulation
Github repository to share some insights about lithography simulation.
OJB-Quantum/Qiskit-Metal-to-Litho
From Qiskit Metal to pattern generation to real nanofabrication demo. Here, quantum devices on a chip are patterned via direct-write electron-beam lithography in a nanofabrication facility. Written & patterned by Onri Jay Benally, an Indigenous American quantum hardware engineer.
nrc-cnrc/Raith_GDSII
MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés
PanithanS/Wafers-Defect-Recognition-using-Visual-Transformer
We use MixedWM38, the mixed-type wafer defect pattern dataset for wafer defect pattern regcognition with visual transformers.
demisjohn/ASML_JobCreator
Generate ASCII Job files for an ASML PAS 5500 Stepper Lithography system, by the UCSB Nanofabrication Facility.
jpcain/data-analytics-machine-learning
Practical example from the SPIE short course "Data Analytics and Machine Learning in Semiconductor Manufacturing: Applications for Physical Design, Process and Yield Optimization"
openMLA/Medjed
Maskless photolithography system targeting 5um resolution. Open hardware design.
PanithanS/Defect-Prediction-in-Semiconductor-Lithography
Lithography defect prediction for microchip manufacturing optimization with machine learning model
ahryciw/Raith_GDSII
MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés
Code-XYZxyz/real-time-interferometric-measurement-control-for-photopolymer-additive-manufacturing
This is a comprehensive MATLAB-based software platform developed for real-time measurement and feedback control of a custom mask-projection photopolymerization based additive manufacturing system (referred as "ECPL", i.e., Exposure Controlled Projection Lithography) using a lab-built interferometry (referred as "ICM&M", i.e., Interferometric Curing Monitoring and Measurement). A graphical user interface using the graphical user interface development environment (GUIDE) of MATLAB was created to implement the ICM&M method for the ECPL process. The software interfaces with the hardware of the ECPL system’s ultraviolet lamp and DMD, and the ICM&M system’s camera. It was designed to streamline the operation of the ECPL process with the aid of parallel computing that implements online both the ICM&M acquisition and measurement analysis as well as the feedback control method. The application logs the acquired interferogram video data, performs numerical computations for the ICM&M measurement algorithms and control law, saves the real-time data and measurement results for all voxels in the region of interest. Meanwhile, it displays interferogram frames and visualize the photocuring process without a substantial sacrifice in temporal performance of other key functions such as data acquisition and measurement & control analysis. The software could be extended to real-time process measurement and control for other additive manufacturing systems, for example, metal based additive manufacturing aided by in-situ thermal images analysis.
hunterjreid/LithoLab
Desktop app for lithography learning available for Windows, macOS, and Linux
NTU-CCA/EE6601
EE6601 Advanced Wafer Processing
ObsiLab/MCSC
[WIP] MCSC - A semiconductor manufacturing mod for Minecraft (Java)
BorisGerretzen/GdsSharp
A C# library for reading, editing, and writing Calma GDSII files.
akashlevy/General-AFM-Lithography
Software used to write conductive nanostructures at the interface of LaAlO3 and SrTiO3
hamzanael2k/Advanced-Lithography-Simulation-Tool
Lithography simulator
rerunner/Scanner
Lithography Equipment Emulator
ssomnath/smart_litho
Vector graphics based nanolithography tool for Asylum Research AFMs
HMels/BondbreakingPMMA
A model that can be plugged into a bigger model by T. Verduin. This model is able to simulate e-beam lithography, and this particular model implements the effect of bondbreaking in PMMA (plastic). This model has been done as part of the Bachelor thesis of Mels Habold for at ImPhys at Delft University of Technology in 2019.
ssomnath/array_lithography
Utilities for performing parallel and simultaneous lithography using an array of self-heating AFM cantilevers
ssomnath/cantilever_temperature_control
Software for controlling the temperature of a self-heating AFM cantilever
ssomnath/micro_stencil
Matlab GUI for manually tracing outlines of images